| Body na spoluautora | Body za publikaci pro MU | Odkaz ISVaV | | 0,00 | 0,00 | Influence of N2 and CH4 on depositon rate of boron based thin films prepared by magnetron sputtering
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| 0,00 | 0,00 | Influence of N2 and CH4 on deposition rate of boron based thin films prepared by magnetron sputtering
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| 0,00 | 0,00 | Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics
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(c) Michal Bulant, 2011