Body na spoluautora | Body za publikaci pro MU | Odkaz ISVaV | 2,01 | 14,04 | Optical Characterization of Ultra-Thin Iron and Iron Oxide Films
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14,80 | 44,41 | Tip-sample relaxation as a source of uncertainty in nanoscale scanning probe microscopy measurements
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8,04 | 40,18 | Influence of substrate material on plasma indeposition/sputtering reactor: experiment and computer simulation
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0,00 | 0,00 | Plasma enhanced CVD of hard DLC/SiOx coatings from methane and hexamethyldisiloxane
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0,97 | 6,81 | Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings
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2,75 | 8,24 | Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry
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8,71 | 60,95 | Optical Characterization of Ultrananocrystalline Diamond Films
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3,15 | 15,76 | Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge
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3,35 | 13,42 | Characterization of near field optical microscope probes
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1,32 | 5,28 | UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction
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4,68 | 9,36 | Scanning probe microscopy analysis of delaminated thin films
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0,00 | 0,00 | Study of thickness reduction of a-C:H thin film under UV light irradiation
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(c) Michal Bulant, 2011